Development of a method to prepare thin metal films samples with controlled 
small/large aspect ratio roughness

Pedroni, M.; Vassallo, E.; Ghezzi, F.; Caniello, R.; Schwarz-Selinger, T.

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Development of a method to prepare thin metal films samples with controlled small/large aspect ratio roughness

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Schwarz-Selinger, T.
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;

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Pedroni, M., Vassallo, E., Ghezzi, F., Caniello, R., & Schwarz-Selinger, T. (2017). Development of a method to prepare thin metal films samples with controlled small/large aspect ratio roughness. Poster presented at 16th International Conference on Plasma-Facing Materials and Components for Fusion Applications (PFMC-16), Neuss.

引用: https://hdl.handle.net/11858/00-001M-0000-002D-7E9A-D

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