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Dual absorber Fe2O3/WO3 host-guest architectures for improved charge generation and transfer in photoelectrochemical applications

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Müller,  Alexander
Nanoanalytics and Interfaces, Independent Max Planck Research Groups, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;
Department of Chemistry and Center for NanoScience (CeNS), Ludwig-Maximilians- Universität München, Butenandtstr. 5-11, D-81377 Munich, Germany;
National Center for Electron Microscopy, Molecular Foundry, Lawrence Berkeley National Laboratory, 1 Cyclotron Rd, Berkeley, CA 94720, United States of America;

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Folger,  Alena
Nanoanalytics and Interfaces, Independent Max Planck Research Groups, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Scheu,  Christina
Nanoanalytics and Interfaces, Independent Max Planck Research Groups, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Citation

Müller, A., Kondofersky, I., Folger, A., Fattakhova-Rohlfing, D., Bein, T., & Scheu, C. (2017). Dual absorber Fe2O3/WO3 host-guest architectures for improved charge generation and transfer in photoelectrochemical applications. Materials Research Express, 4(1): 016409, pp. 1-9. doi:10.1088/2053-1591/aa570f.


Cite as: http://hdl.handle.net/11858/00-001M-0000-002D-A139-5
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