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Elementary Surface Processes during Growth and Erosion of Amorphous Hydrogenated Carbon Films

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Jacob,  W.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;

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Hopf,  C.
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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von Keudell,  A.
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

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Meier,  M.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;

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Schwarz-Selinger,  T.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;

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Jacob, W., Hopf, C., von Keudell, A., Meier, M., & Schwarz-Selinger, T. (2003). Elementary Surface Processes during Growth and Erosion of Amorphous Hydrogenated Carbon Films. Talk presented at 5th Meeting on Diamond, Amorphous Carbon, Nanotubes and Related Materials. Rio de Janeiro. 2003-11-10 - 2003-11-11.


Cite as: https://hdl.handle.net/11858/00-001M-0000-002E-9425-B
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