English
 
User Manual Privacy Policy Disclaimer Contact us
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT

Released

Talk

Elementary Surface Processes during Growth of a-C:H Films

MPS-Authors
/persons/resource/persons109597

von Keudell,  A.
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons109440

Hopf,  C.
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons109922

Meier,  M.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons110460

Schwarz-Selinger,  T.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons109489

Jacob,  W.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;

External Ressource
No external resources are shared
Fulltext (public)
There are no public fulltexts stored in PuRe
Supplementary Material (public)
There is no public supplementary material available
Citation

von Keudell, A., Hopf, C., Meier, M., Schwarz-Selinger, T., & Jacob, W. (2003). Elementary Surface Processes during Growth of a-C:H Films. Talk presented at ASEVA Workshop 14: Reactive Plasmas - Physical and Chemical Processes in Reactive Hydrocarbon Plasmas in Contact with Surfaces. Avila. 2003-07-22 - 2003-07-25.


Cite as: http://hdl.handle.net/11858/00-001M-0000-002E-943B-C
Abstract
There is no abstract available