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A Microscopic Model for Chemical Sputtering of Carbon

MPS-Authors
/persons/resource/persons109489

Jacob,  W.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons109440

Hopf,  C.
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;

/persons/resource/persons110460

Schwarz-Selinger,  T.
Surface Science (OP), Max Planck Institute for Plasma Physics, Max Planck Society;
Centre for Interdisciplinary Plasma Science (CIPS), Max Planck Institute for Plasma Physics, Max Planck Society;

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Citation

Jacob, W., Hopf, C., Schlüter, M., & Schwarz-Selinger, T. (2004). A Microscopic Model for Chemical Sputtering of Carbon. Poster presented at 16th International Conference on Plasma Surface Interactions in Controlled Fusion Devices (PSI 16), Portland, Maine.


Cite as: http://hdl.handle.net/21.11116/0000-0000-0BD1-8
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