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Deposition and Erosion of amorphous carbon (a-C:H) films in H and N containing low-temperature laboratory plasmas

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Jacob,  W.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

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Hopf,  C.
Experimental Plasma Physics 4 (E4), Max Planck Institute for Plasma Physics, Max Planck Society;
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

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Schwarz-Selinger,  T.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

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Sun,  C.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

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Jacob, W., Hopf, C., Schlüter, M., Schwarz-Selinger, T., & Sun, C. (2006). Deposition and Erosion of amorphous carbon (a-C:H) films in H and N containing low-temperature laboratory plasmas. Poster presented at 17th International Conference on Plasma Surface Interactions in Controlled Fusion Devices (PSI 17), Hefei Anhui.


Cite as: https://hdl.handle.net/21.11116/0000-0000-1231-4
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