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Molecular size effect in the chemical sputtering of a-C:H thin films by low energy H+, H2+, and H3+ ions

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Jacob,  W.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

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Schwarz-Selinger,  T.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

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von Toussaint,  U.
Material Research (MF), Max Planck Institute for Plasma Physics, Max Planck Society;

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Harris, P. R., Meyer, F. W., Jacob, W., Schwarz-Selinger, T., & von Toussaint, U. (2010). Molecular size effect in the chemical sputtering of a-C:H thin films by low energy H+, H2+, and H3+ ions. Talk presented at 18th International Workshop on Inelastic Ion-Surface Collisions (IISC-18). Gatlinburg, TN. 2010-09-26 - 2010-10-01.


Cite as: https://hdl.handle.net/21.11116/0000-0000-56A0-A
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