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Erbium oxide thin films deposited by filtered cathodic arc and high-power impulse magnetron sputtering

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Koch,  F.
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;

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Houben,  A.
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;

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Lindig,  S.
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;

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Linsmeier,  Ch.
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;

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Citation

Koch, F., Houben, A., Lindig, S., & Linsmeier, C. (2012). Erbium oxide thin films deposited by filtered cathodic arc and high-power impulse magnetron sputtering. Poster presented at 13th International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen.


Cite as: http://hdl.handle.net/21.11116/0000-0000-8704-3
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