Fabrication of thermosensitive polymer nanopatterns through chemical 
lithography and atom transfer radical polymerization

He, Qiang; Küller, Alexander; Grunze, Michael; Li, Junbai

doi:10.1021/la062793u

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Fabrication of thermosensitive polymer nanopatterns through chemical lithography and atom transfer radical polymerization

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Grunze, Michael
Cellular Biophysics, Max Planck Institute for Medical Research, Max Planck Society;

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Citation

He, Q., Küller, A., Grunze, M., & Li, J. (2007). Fabrication of thermosensitive polymer nanopatterns through chemical lithography and atom transfer radical polymerization. Langmuir, 23(7), 3981-3987. doi:10.1021/la062793u.

Cite as: https://hdl.handle.net/21.11116/0000-0001-9EC4-0

Abstract

Micro- and nanopatterns of thermosensitive poly(N-isopropylacrylamide) brush on gold substrate were prepared by using chemical lithography combined with surface-initiated atom transfer radical polymerization. Self-assembled monolayers of 4'-nitro-1, 1'-biphenyl-4-thiol were structured by chemical lithography which produced cross-linked 4'-amino-1,1'-biphenyl-4-thiol monolayer within a nitro-terminated matrix. The terminal amino groups in monolayers were bounded with the surface initiator bromoisobutyryl bromide. After polymerization, the smallest size can reach to 70-nm line width and dots. The thermosensitivity of poly(N-isopropylacrylamide) brushes is demonstrated by contact angle measurement and fluid atomic force microscopy. This fabrication approach allows creating spatially defined polymer patterns and provides a simple and versatile method to construct complex micro- and nanopatterned polymer brushes with spatial and topographic control in a single step.