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Journal Article

Generation of surface amino groups on aromatic self-assembled monolayers by low energy electron beams – A first step towards chemical lithography

MPS-Authors
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Grunze,  Michael
Cellular Biophysics, Max Planck Institute for Medical Research, Max Planck Society;

External Resource

https://onlinelibrary.wiley.com/doi/epdf/10.1002/%28SICI%291521-4095%28200006%2912%3A11%3C805%3A%3AAID-ADMA805%3E3.0.CO%3B2-0
(Any fulltext)

https://doi.org/10.1002/(SICI)1521-4095(200006)12:11%3C805::AID-ADMA805%3E3.0.CO;2-0
(Any fulltext)

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Citation

Eck, W., Stadler, V., Geyer, W., Zharnikov, M., Gölzhäuser, A., & Grunze, M. (2000). Generation of surface amino groups on aromatic self-assembled monolayers by low energy electron beams – A first step towards chemical lithography. Advanced Materials, 12(11), 805-808. doi:10.1002/(SICI)1521-4095(200006)12:11%3C805:AID-ADMA805%3E3.0.CO;2-0.


Cite as: https://hdl.handle.net/21.11116/0000-0001-BB22-6
Abstract
Chemically defined surface patterning has been achieved via irradiation with low‐energy electrons. Irradiation of nitro‐arene‐thiol monolayers leads to the reduction of the nitro groups to amino groups, which can then be further chemically modified. The Figure shows such a monolayer that was irradiated through a copper grid followed by acylation with trifluoroacetic acid anhydride.