Nanoscale patterning of self-assembled monolayers with electrons

Gölzhäuser, A.; Geyer, W.; Stadler, V.; Eck, W.; Grunze, M.; Edinger, K.; Weimann, Th.; Hinze, P.

doi:10.1116/1.1319711

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Nanoscale patterning of self-assembled monolayers with electrons

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Grunze, M.
Cellular Biophysics, Max Planck Institute for Medical Research, Max Planck Society;

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Citation

Gölzhäuser, A., Geyer, W., Stadler, V., Eck, W., Grunze, M., Edinger, K., et al. (2000). Nanoscale patterning of self-assembled monolayers with electrons. Journal of Vacuum Science and Technology B, 18(6), 3414-3418. doi:10.1116/1.1319711.

Cite as: https://hdl.handle.net/21.11116/0000-0001-BC99-F

Abstract

We show the fabrication of gold nanostructures using self-assembled monolayers of aliphatic and aromatic thiols as positive and negative electron beam resists. We applied a simple and versatile proximity printing technique using focused ion beam structured stencil masks and low energy (300 eV) electrons. We also used conventional e-beam lithography with a beam energy of 2.5 keV and doses from 3500 to 80 000 μC/cm2. Gold patterns were generated by wet etching in KCN/KOH and characterized by atomic force microscopy and scanning electron microscopy. The width of the finest lines is ∼20 nm; their edge definition is limited by the isotropic etching process in the polycrystalline gold.