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Journal Article

Chemical nanolithography with electron beams

MPS-Authors
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Grunze,  Michael
Cellular Biophysics, Max Planck Institute for Medical Research, Max Planck Society;

External Resource

https://onlinelibrary.wiley.com/doi/epdf/10.1002/1521-4095%28200106%2913%3A11%3C803%3A%3AAID-ADMA806%3E3.0.CO%3B2-W
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https://doi.org/10.1002/1521-4095(200106)13:11%3C803::AID-ADMA806%3E3.0.CO;2-W
(Any fulltext)

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Citation

Gölzhäuser, A., Eck, W., Geyer, W., Stadler, V., Weimann, T., Hinze, P., et al. (2001). Chemical nanolithography with electron beams. Advanced Materials, 13(11), 803-806. doi:10.1002/1521-4095(200106)13:11%3C803:AID-ADMA806%3E3.0.CO;2-W.


Cite as: https://hdl.handle.net/21.11116/0000-0001-BDE6-7
Abstract
A highly focused electron beam as the agent for spatially selective reductionof nitro groups to amino groups in a self‐assembled monolayer of aromatics is the key feature of a novel technique in chemical nanolithography presented here. Treatment of the reactive amino groups with different reactants after each e‐beam writing step yields a surface with a defined array of chemically diverse structures; for example, see the line pattern in the Figure.