English
 
Help Privacy Policy Disclaimer
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT

Released

Journal Article

Growth of H2O layers on an ultra-thin Al2O3 film: from monomeric species to ice

MPS-Authors
/persons/resource/persons211638

Grunze,  Michael
Cellular Biophysics, Max Planck Institute for Medical Research, Max Planck Society;

Fulltext (restricted access)
There are currently no full texts shared for your IP range.
Fulltext (public)
There are no public fulltexts stored in PuRe
Supplementary Material (public)
There is no public supplementary material available
Citation

Tzvetkov, G., Zubavichus, Y., Koller, G., Schmidt, T., Heske, C., Umbach, E., et al. (2003). Growth of H2O layers on an ultra-thin Al2O3 film: from monomeric species to ice. Surface Science, 543(1-3), 131-140. doi:10.1016/S0039-6028(03)01029-X.


Cite as: https://hdl.handle.net/21.11116/0000-0001-D51B-1
Abstract
Adsorption of water on an ultra-thin alumina film grown epitaxially onto NiAl(1 1 0) has been investigated by temperature-programmed desorption, work function measurements, ultraviolet photoelectron spectroscopy, and high-resolution X-ray photoelectron spectroscopy as a function of surface coverage at 100 K. At low coverages monomeric H2O species are adsorbed and it is proposed that the oxygen lone pair orbitals interact weakly via polarisation forces with the Al3+ cations of the second layer. No indication for the dissociation of H2O and the formation of OH− species has been found. For intermediate coverages clustering of H2O molecules occurs and the growth of a three-dimensional ice layer is observed. Care has to be exercised in photoemission experiments of ice layers, since UV photon-induced dissociation of H2O in thicker ice layers is indicated.