High-throughput synthesis of modified Fresnel zone plate arrays via ion beam 
lithography

Keskinbora, K.; Sanli, U. T.; Baluktsian, M.; Grévent, C.; Weigand, M.; Schütz, G.

doi:10.3762/bjnano.9.194

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High-throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography

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Keskinbora, K.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Sanli, U. T.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

/persons/resource/persons224492

Baluktsian, M.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Grévent, C.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Weigand, M.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Schütz, G.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Keskinbora, K., Sanli, U. T., Baluktsian, M., Grévent, C., Weigand, M., & Schütz, G. (2018). High-throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography. Beilstein Journal of Nanotechnology, 9, 2049-2056. doi:10.3762/bjnano.9.194.

Cite as: https://hdl.handle.net/21.11116/0000-0001-DBE6-5

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