Use of micro-beam PIXE and NRA in postmortem analysis of samples exposed in 
plasma devices

Kelemen, M.; Zaloznik, A.; Pecovnik, M.; Vavpetic, P.; Pelicon, P.; Hakola, An.; Laan, M.; Kapser, S.; Markelj, S.

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Use of micro-beam PIXE and NRA in postmortem analysis of samples exposed in plasma devices

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Kapser, S.
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;

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Kelemen, M., Zaloznik, A., Pecovnik, M., Vavpetic, P., Pelicon, P., Hakola, A., et al. (2018). Use of micro-beam PIXE and NRA in postmortem analysis of samples exposed in plasma devices. Poster presented at European Conference on X-Ray Spectrometry, Ljubljana.

Cite as: https://hdl.handle.net/21.11116/0000-0001-E7F2-9

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