Effect of bias voltage on microstructure and optical properties of Al2O3 thin 
films prepared by twin targets reactive high power impulse magnetron sputtering

Zhou, G.; Wang, L.; Wang, X.; Yu, Y.; Mutzke, A.

doi:10.1016/j.vacuum.2019.04.060

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Effect of bias voltage on microstructure and optical properties of Al₂O₃ thin films prepared by twin targets reactive high power impulse magnetron sputtering

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Mutzke, A.
Stellarator Theory (ST), Max Planck Institute for Plasma Physics, Max Planck Society;

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Zhou, G., Wang, L., Wang, X., Yu, Y., & Mutzke, A. (2019). Effect of bias voltage on microstructure and optical properties of Al₂O₃ thin films prepared by twin targets reactive high power impulse magnetron sputtering. Vacuum, 166, 88-96. doi:10.1016/j.vacuum.2019.04.060.

Cite as: https://hdl.handle.net/21.11116/0000-0003-ADFA-1

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