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Anomalous formation of micrometer-thick amorphous oxide surficial layers during high-temperature oxidation of ZrAl2

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Schützendübe,  Peter
Central Scientific Facility Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Hu, Z., Xu, Y., Chen, Y., Schützendübe, P., Wang, J., Huang, Y., Liu, Y., & Wang, Z. (2019). Anomalous formation of micrometer-thick amorphous oxide surficial layers during high-temperature oxidation of ZrAl2. Journal of Materials Science & Technology, 35(7), 1479-1484. doi:10.1016/j.jmst.2019.02.005.


引用: https://hdl.handle.net/21.11116/0000-0004-596E-E
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