Anomalous formation of micrometer-thick amorphous oxide surficial layers during 
high-temperature oxidation of ZrAl2

Hu, Zhangping; Xu, Yifei; Chen, Yuanyuan; Schützendübe, Peter; Wang, Jiangyong; Huang, Yuan; Liu, Yongchang; Wang, Zumin

doi:10.1016/j.jmst.2019.02.005

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Anomalous formation of micrometer-thick amorphous oxide surficial layers during high-temperature oxidation of ZrAl₂

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Schützendübe, Peter
Central Scientific Facility Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Hu, Z., Xu, Y., Chen, Y., Schützendübe, P., Wang, J., Huang, Y., et al. (2019). Anomalous formation of micrometer-thick amorphous oxide surficial layers during high-temperature oxidation of ZrAl₂. Journal of Materials Science & Technology, 35(7), 1479-1484. doi:10.1016/j.jmst.2019.02.005.

Cite as: https://hdl.handle.net/21.11116/0000-0004-596E-E

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