Tailoring metal film texture by use of high atomic mobility at 
metalsemiconductor interfaces

Wang, Jing; Schützendübe, Peter; Qiu, Yongxing; Wang, Jiangyong; Huang, Yuan; Liu, Yongchang; Wang, Zumin

doi:10.1016/j.apsusc.2018.12.260

Item

ITEM ACTIONSEXPORT

Add to Basket

Local TagsRelease HistoryDetailsSummary

Released

Journal Article

Tailoring metal film texture by use of high atomic mobility at metalsemiconductor interfaces

MPS-Authors

/persons/resource/persons238648

Schützendübe, Peter
Central Scientific Facility Materials, Max Planck Institute for Intelligent Systems, Max Planck Society;

External Resource

No external resources are shared

Fulltext (restricted access)

There are currently no full texts shared for your IP range.

Fulltext (public)

There are no public fulltexts stored in PuRe

Supplementary Material (public)

There is no public supplementary material available

Citation

Wang, J., Schützendübe, P., Qiu, Y., Wang, J., Huang, Y., Liu, Y., et al. (2019). Tailoring metal film texture by use of high atomic mobility at metalsemiconductor interfaces. Applied Surface Science, 475, 117-123. doi:10.1016/j.apsusc.2018.12.260.

Cite as: https://hdl.handle.net/21.11116/0000-0004-5979-1

Abstract

There is no abstract available