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Variable chemical decoration of extended defects in Cu-poor Cu2ZnSnSe4 thin films

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Schwarz,  Torsten
Atom Probe Tomography, Microstructure Physics and Alloy Design, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Peng,  Zirong
Microstructure Physics and Alloy Design, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Gault,  Baptiste
Atom Probe Tomography, Microstructure Physics and Alloy Design, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Raabe,  Dierk
Microstructure Physics and Alloy Design, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Citation

Schwarz, T., Redinger, A., Siebentritt, S., Peng, Z., Gault, B., Raabe, D., et al. (2019). Variable chemical decoration of extended defects in Cu-poor Cu2ZnSnSe4 thin films. Physical Review Materials, 3: 035402. doi:10.1103/PhysRevMaterials.3.035402.


Cite as: http://hdl.handle.net/21.11116/0000-0004-8A8C-3
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