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https://doi.org/10.1016/j.jnucmat.2019.151767 (Verlagsversion)
Schmitz_Preferential.pdf (beliebiger Volltext), 5MB
Schmitz, J., Mutzke, A., Litnovsky, A., Klein, F., Tan, X. Y., Wegener, T., et al. (2019). Preferential sputtering induced Cr-Diffusion during plasma exposure of WCrY smart alloys. Journal of Nuclear Materials, 526: 151767. doi:10.1016/j.jnucmat.2019.151767.
