Topological Defect-Induced Magnetism in a Nanographene

Mishra, Shantanu; Beyer, Doreen; Berger, Reinhard; Liu, Junzhi; Gröning, Oliver; Urgel, José I.; Müllen, Klaus; Ruffieux, Pascal; Feng, Xinliang; Fasel, Roman

doi:10.1021/jacs.9b09212

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Topological Defect-Induced Magnetism in a Nanographene

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Müllen, Klaus
Dept. Müllen: Synthetic Chemistry, MPI for Polymer Research, Max Planck Society;

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Mishra, S., Beyer, D., Berger, R., Liu, J., Gröning, O., Urgel, J. I., et al. (2020). Topological Defect-Induced Magnetism in a Nanographene. Journal of the American Chemical Society, 142(3), 1147-1152. doi:10.1021/jacs.9b09212.

Cite as: https://hdl.handle.net/21.11116/0000-0005-A071-6

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