Deposition of Tungsten Thin Films by Magnetron Sputtering for Large-Scale 
Production of Tungsten-Based Transition-Edge Sensors

Abdelhameed, A. H.; Angloher, G.; Bauer, P.; Bento, A.; Bertoldo, E.; Canonica, L.; Fuchs, D.; Hauff, D.; Ferreiro Iachellini, N.; Mancuso, M.; Petricca, F.; Pröbst, F.; Riesch, J.; Rothe, J.

doi:10.1007/s10909-020-02357-x

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Deposition of Tungsten Thin Films by Magnetron Sputtering for Large-Scale Production of Tungsten-Based Transition-Edge Sensors

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Riesch, J.
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;

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Abdelhameed, A. H., Angloher, G., Bauer, P., Bento, A., Bertoldo, E., Canonica, L., et al. (2020). Deposition of Tungsten Thin Films by Magnetron Sputtering for Large-Scale Production of Tungsten-Based Transition-Edge Sensors. Journal of Low Temperature Physics, 199(1-2), 401-407. doi:10.1007/s10909-020-02357-x.

Cite as: https://hdl.handle.net/21.11116/0000-0005-C55B-7

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