English
 
Help Privacy Policy Disclaimer
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT

Released

Book Chapter

Reflection high-energy electron diffraction and 119sn mössbauer investigation of epitaxial α-sn films

MPS-Authors
There are no MPG-Authors available
External Resource
No external resources are shared
Fulltext (public)
There are no public fulltexts stored in PuRe
Supplementary Material (public)
There is no public supplementary material available
Citation

Roldan Cuenya, B., Doi, M., Marks, O., Keune, W., & Mibu, K. (2000). Reflection high-energy electron diffraction and 119sn mössbauer investigation of epitaxial α-sn films. In P. Entel, & D. E. Wolf (Eds.), Structure and Dynamics of Heterogeneous Systems (pp. 251-262). Singapore: World Scientific.


Cite as: http://hdl.handle.net/21.11116/0000-0006-EC1D-1
Abstract
Structure and growth of epitaxial Sn films on InSb(001), Cu(001) and fcc-Fe/Cu(001) substrates were investigated by reflection high-energy electron diffraction (RHEED) and 119Sn Mössbauer spectroscopy. The Sn films grow epitaxially in the α-Sn(001) phase up to 1100 Å thickness on InSb, up to 5.5 ML on Cu(001), and up to 2.7 ML on fcc-Fe/Cu(001). Various surface reconstructions as a function of Sn coverage have been observed. The in-plane lattice parameter of the α-Sn overlayer was studied as a function of coverage.