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Journal Article

A Novel Shadowgraphic Inline Measurement Technique for Image-Based Crystal Size Distribution Analysis

MPS-Authors
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Lorenz,  Heike
Physical and Chemical Foundations of Process Engineering, Max Planck Institute for Dynamics of Complex Technical Systems, Max Planck Society;

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Seidel-Morgenstern,  Andreas
Physical and Chemical Foundations of Process Engineering, Max Planck Institute for Dynamics of Complex Technical Systems, Max Planck Society;
Otto-von-Guericke-Universität Magdeburg, External Organizations;

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Temmel,  Erik
Physical and Chemical Foundations of Process Engineering, Max Planck Institute for Dynamics of Complex Technical Systems, Max Planck Society;
Sulzer Chemtech Ltd., Gewerbestraße 28, 4123 Allschwil, Switzerland;

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Fulltext (public)

temmel_3251324.pdf
(Publisher version), 9MB

Supplementary Material (public)
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Citation

Wirz, D., Hofmann, M., Lorenz, H., Bart, H.-J., Seidel-Morgenstern, A., & Temmel, E. (2020). A Novel Shadowgraphic Inline Measurement Technique for Image-Based Crystal Size Distribution Analysis. Crystals, 10(9): 740. doi:10.3390/cryst10090740.


Cite as: http://hdl.handle.net/21.11116/0000-0006-F775-0
Abstract
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