Enhanced photoelectrochemical water oxidation performance by fluorine 
incorporation in BiVO4 and Mo: BiVO4 thin film photoanodes

Rohloff, Martin; Anke, Björn; Kasian, Olga; Zhang, Siyuan; Lerch, Martin; Scheu, Christina; Fischer, Anna

doi:10.1021/acsami.8b16617

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Enhanced photoelectrochemical water oxidation performance by fluorine incorporation in BiVO₄ and Mo: BiVO₄ thin film photoanodes

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Kasian, Olga
Electrocatalysis, Interface Chemistry and Surface Engineering, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Zhang, Siyuan
Nanoanalytics and Interfaces, Independent Max Planck Research Groups, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Scheu, Christina
Nanoanalytics and Interfaces, Independent Max Planck Research Groups, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Rohloff, M., Anke, B., Kasian, O., Zhang, S., Lerch, M., Scheu, C., et al. (2019). Enhanced photoelectrochemical water oxidation performance by fluorine incorporation in BiVO₄ and Mo: BiVO₄ thin film photoanodes. ACS Applied Materials and Interfaces, 11(18), 16430-16442. doi:10.1021/acsami.8b16617.

Cite as: https://hdl.handle.net/21.11116/0000-0007-2FFC-A

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