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Journal Article

In situ x-ray diffraction and spectro-microscopic study of ALD protected copper films

MPS-Authors
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Dogan,  G.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;
Robert Bosch GmbH, Automotive Electronics;

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Sanli,  U. T.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Schütz,  G.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Keskinbora,  K.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

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Dogan, G., Sanli, U. T., Hahn, K., Müller, L., Gruhn, H., Silber, C., et al. (2020). In situ x-ray diffraction and spectro-microscopic study of ALD protected copper films. ACS Applied Materials and Interfaces, 12(29), 33377-33385. doi:10.1021/acsami.0c06873.


Cite as: https://hdl.handle.net/21.11116/0000-0007-31DF-7
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