Challenges of Topological Insulator Research: Bi2Te3 Thin Films and Magnetic 
Heterostructures

Pereira, Vanda M.; Wu, Chi-Nan; Höfer, Katharina; Choa, Arnold; Knight, Cariad-A.; Swanson, Jesse; Becker, Christoph; Komarek, Alexander C.; Rata, A. Diana; Rößler, Sahana; Wirth, Steffen; Guo, Mengxin; Hong, Minghwei; Kwo, Jueinai; Tjeng, Liu Hao; Altendorf, Simone G.

doi:10.1002/pssb.202000346

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Challenges of Topological Insulator Research: Bi₂Te₃ Thin Films and Magnetic Heterostructures

MPS-Authors

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Pereira, Vanda M.
Physics of Correlated Matter, Max Planck Institute for Chemical Physics of Solids, Max Planck Society;

/persons/resource/persons246250

Wu, Chi-Nan
Physics of Correlated Matter, Max Planck Institute for Chemical Physics of Solids, Max Planck Society;

/persons/resource/persons135844

Höfer, Katharina
Physics of Correlated Matter, Max Planck Institute for Chemical Physics of Solids, Max Planck Society;

/persons/resource/persons249713

Choa, Arnold
Physics of Correlated Matter, Max Planck Institute for Chemical Physics of Solids, Max Planck Society;

/persons/resource/persons249715

Knight, Cariad-A.
Physics of Correlated Matter, Max Planck Institute for Chemical Physics of Solids, Max Planck Society;

/persons/resource/persons135848

Swanson, Jesse
Physics of Correlated Matter, Max Planck Institute for Chemical Physics of Solids, Max Planck Society;

/persons/resource/persons135846

Becker, Christoph
Physics of Correlated Matter, Max Planck Institute for Chemical Physics of Solids, Max Planck Society;

/persons/resource/persons126701

Komarek, Alexander C.
Alexander Komarek, Physics of Correlated Matter, Max Planck Institute for Chemical Physics of Solids, Max Planck Society;

/persons/resource/persons126813

Rata, A. Diana
Diana Rata, Physics of Correlated Matter, Max Planck Institute for Chemical Physics of Solids, Max Planck Society;

/persons/resource/persons126821

Rößler, Sahana
Physics of Correlated Matter, Max Planck Institute for Chemical Physics of Solids, Max Planck Society;

/persons/resource/persons126910

Wirth, Steffen
Steffen Wirth, Physics of Correlated Matter, Max Planck Institute for Chemical Physics of Solids, Max Planck Society;

/persons/resource/persons126881

Tjeng, Liu Hao
Liu Hao Tjeng, Physics of Correlated Matter, Max Planck Institute for Chemical Physics of Solids, Max Planck Society;

/persons/resource/persons126515

Altendorf, Simone G.
Simone Altendorf, Physics of Correlated Matter, Max Planck Institute for Chemical Physics of Solids, Max Planck Society;

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Citation

Pereira, V. M., Wu, C.-N., Höfer, K., Choa, A., Knight, C.-A., Swanson, J., et al. (2020). Challenges of Topological Insulator Research: Bi₂Te₃ Thin Films and Magnetic Heterostructures. Physica Status Solidi B, 2000346, pp. 1-16. doi:10.1002/pssb.202000346.

Cite as: https://hdl.handle.net/21.11116/0000-0007-330C-3

Abstract

Topological insulators (TIs) are of particular interest in the recent solid-state research because of their exceptional features stemming from the conducting, topologically protected surface states. The exotic properties include the occurrence of novel quantum phenomena and make them promising materials for spintronics and quantum computing applications. Theoretical studies have provided a vast amount of valuable predictions and proposals, whose experimental observation and implementation, to date, are often hindered by an insufficient sample quality. The effect of even a relatively low concentration of defects can make the access to purely topological surface states impossible. This points out the need of high-quality bulk-insulating materials with ultra-clean surfaces/interfaces, which requires sophisticated sample/device preparations as well as special precautions during the measurements. Herein, the challenging work on 3D TI thin films with a focus onBi2Te3is reported. It covers the optimization of the molecular beam epitaxy growth process, the in situ characterization of surface states and transport properties, the influence of exposure to ambient gases and of capping layers, as well as the effect of interfacing TI thin film with magnetic materials.