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TEM study of tantalum clusters on Al2O3/NiAl(110)

MPS-Authors
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Nepijko,  Sergej A.
Physical Chemistry, Fritz Haber Institute, Max Planck Society;

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Klimenkov,  Michail
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Kuhlenbeck,  Helmut
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Zemlyanov,  Dimitry
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

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Herein,  Daniel
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

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Schlögl,  Robert
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

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Freund,  Hans-Joachim
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Citation

Nepijko, S. A., Klimenkov, M., Kuhlenbeck, H., Zemlyanov, D., Herein, D., Schlögl, R., et al. (1998). TEM study of tantalum clusters on Al2O3/NiAl(110). Surface Science, 412-413, 192-201. doi:10.1016/S0039-6028(98)00387-2.


Cite as: http://hdl.handle.net/21.11116/0000-0007-4EE7-E
Abstract
Employing transmission electron microscopy (TEM), energy dispersive X-ray analysis (EDX) and X-ray photoelectron spectroscopy (XPS) we have studied tantalum clusters on a thin Al2O3 film epitaxially grown on NiAl(110). Our data reveal that the clusters are three dimensional, growing epitaxially on the oxide film with their [110] directions parallel to the surface normal and Ta[001]‖NiAl[001]. From the observed moiré fringes the tantalum lattice constant could be determined as a function of the cluster size. We found that the lattice constant decreases with decreasing cluster size with the highest observed reduction being 4.5% for a cluster with a diameter of 12.5 Å. Interestingly the clusters are only partly oxidized as concluded from XPS, TEM and EDX data although the samples were exposed to air after cluster deposition.