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Nonadiabatic surface reaction: Mechanism of electron emission in the Cs+O2 system

MPS-Authors
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Böttcher,  Artur
Fritz Haber Institute, Max Planck Society;

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Imbeck,  R.
Fritz Haber Institute, Max Planck Society;

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Morgante,  A.
Fritz Haber Institute, Max Planck Society;

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Ertl,  Gerhard
Physical Chemistry, Fritz Haber Institute, Max Planck Society;

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PhysRevLett.65.2035.pdf
(Publisher version), 160KB

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Citation

Böttcher, A., Imbeck, R., Morgante, A., & Ertl, G. (1990). Nonadiabatic surface reaction: Mechanism of electron emission in the Cs+O2 system. Physical Review Letters, 65(16), 2035-2037. doi:10.1103/PhysRevLett.65.2035.


Cite as: https://hdl.handle.net/21.11116/0000-0007-5F4E-9
Abstract
Electron emission during oxidation of thin Cs films is confined to the stage Cs2O2→CsO2 and is caused by Auger deexcitation accompanying the (formal) reaction O2-2(s)+O2→2O-2(s). This nonadiabatic process becomes possible because resonance ionization of the affinity level of the impinging O2 molecule upon crossing the Fermi level EF is efficiently suppressed due to the absence of occupied states near EF at the surface.