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Journal Article

Plasmonic and semiconductor nanoparticles interfere with stereolithographic 3D printing

MPS-Authors
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Momper,  Rebecca
Dept. Landfester: Physical Chemistry of Polymers, MPI for Polymer Research, Max Planck Society;

Landeta,  Antonio Ibanez
Laboratory for Fluid Physics, Pattern Formation and Biocomplexity, Max Planck Institute for Dynamics and Self-Organization, Max Planck Society;

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Yang,  Long
Dept. Landfester: Physical Chemistry of Polymers, MPI for Polymer Research, Max Planck Society;

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Halim,  Henry
Dept. Landfester: Physical Chemistry of Polymers, MPI for Polymer Research, Max Planck Society;

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Therien-Aubin,  Heloise
Dept. Landfester: Physical Chemistry of Polymers, MPI for Polymer Research, Max Planck Society;

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Bodenschatz,  Eberhard
Laboratory for Fluid Physics, Pattern Formation and Biocomplexity, Max Planck Institute for Dynamics and Self-Organization, Max Planck Society;

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Landfester,  Katharina
Dept. Landfester: Physical Chemistry of Polymers, MPI for Polymer Research, Max Planck Society;

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Riedinger,  Andreas
Dept. Landfester: Physical Chemistry of Polymers, MPI for Polymer Research, Max Planck Society;

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Fulltext (public)

acsami.0c14546.pdf
(Publisher version), 6MB

Supplementary Material (public)
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Citation

Momper, R., Landeta, A. I., Yang, L., Halim, H., Therien-Aubin, H., Bodenschatz, E., et al. (2020). Plasmonic and semiconductor nanoparticles interfere with stereolithographic 3D printing. ACS Applied Materials and Interfaces, 12(45), 50834-50843. doi:10.1021/acsami.0c14546.


Cite as: http://hdl.handle.net/21.11116/0000-0007-6FE8-8
Abstract
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