Absence of a Crystal Direction Regime in which Sputtering Corresponds to 
Amorphous Material

Schlueter, K.; Nordlund, K.; Hobler, G.; Balden, M.; Granberg, F.; Flinck, O.; Silva, T.  F. da; Neu, R.

doi:10.1103/PhysRevLett.125.225502

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Absence of a Crystal Direction Regime in which Sputtering Corresponds to Amorphous Material

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Schlueter, K.
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;
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Balden, M.
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;

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Neu, R.
Plasma Edge and Wall (E2M), Max Planck Institute for Plasma Physics, Max Planck Society;

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Schlueter, K., Nordlund, K., Hobler, G., Balden, M., Granberg, F., Flinck, O., et al. (2020). Absence of a Crystal Direction Regime in which Sputtering Corresponds to Amorphous Material. Physical Review Letters, 125: 225502. doi:10.1103/PhysRevLett.125.225502.

Cite as: https://hdl.handle.net/21.11116/0000-0007-8781-E

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