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Spectroscopic investigations of YAG-laser-driven microdroplet-tin plasma sources of extreme ultraviolet radiation for nanolithography

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Bekker,  H.
Division Prof. Dr. Thomas Pfeifer, MPI for Nuclear Physics, Max Planck Society;

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Crespo López Urrutia,  J. R.
Division Prof. Dr. Thomas Pfeifer, MPI for Nuclear Physics, Max Planck Society;

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Citation

Versolato, O., Bayerle, A., Bayraktar, M., Behnke, L., Bekker, H., Bouza, Z., et al. (2020). Spectroscopic investigations of YAG-laser-driven microdroplet-tin plasma sources of extreme ultraviolet radiation for nanolithography. Journal of Physics: Conference Series, 1412: 192006. doi:10.1088/1742-6596/1412/19/192006.


Cite as: http://hdl.handle.net/21.11116/0000-0008-1982-9
Abstract
Highly charged tin ions are the sources of extreme ultraviolet (EUV) light at 13.5-nm wavelength in laser-produced transient plasmas for next-generation nanolithography. Generating this EUV light at the required power, reliability, and stability however presents a formidable task that combines industrial innovations with challenging scientific questions. We will present work on the spectroscopy of tin ions in and out of YAG-laser-driven plasma and present a surprising answer to the key question: what makes that light?