Temperature dependence of luminescence from dislocated Ge on Si substrate

Schwartz, Bernhard; Reiche, Manfred; Kittler, Martin

doi:10.1016/j.matpr.2018.03.061

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Temperature dependence of luminescence from dislocated Ge on Si substrate

MPS-Authors

Reiche, Manfred
Nano-Systems from Ions, Spins and Electrons, Max Planck Institute of Microstructure Physics, Max Planck Society;

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https://doi.org/10.1016/j.matpr.2018.03.061
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Schwartz, B., Reiche, M., & Kittler, M. (2018). Temperature dependence of luminescence from dislocated Ge on Si substrate. Materials today: Proceedings, 5(6), 14712-14721. doi:10.1016/j.matpr.2018.03.061.

Cite as: https://hdl.handle.net/21.11116/0000-0009-2E83-0

Abstract

For mono-crystalline Ge the indirect luminescence intensity declines upon growing temperature from 80 to 300 K, whereas for dislocated Ge structures the opposite behavior occurs. These findings are comparable to earlier observations on Si. The drop of the luminescence in dislocated material upon lowering temperature was attributed to the increase of the competing non-radiative recombination due to shallow dislocation states. In opposition to the indirect luminescence, the character of the direct Ge luminescence, i.e. incline of intensity upon growing temperature, is not converted by dislocations. The measured behavior of the direct peak position of Ge, in the temperature range between 80 and 300 K, is in accordance with calculated dependence and reflects the direct bandgap energy. The observed red shifts in dislocated Ge structures are shown to be produced by tensile strain, bandgap narrowing and by the Sn-content of GeSn quantum wells, respectively. A direct influence of dislocations could not be observed. Satisfying understanding of the existing temperature behavior of the indirect Ge peak position is on embryonic stage.