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Investigation of surfaces by scanning photoemission microscopy

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Rotermund,  Harm-Hinrich
Physical Chemistry, Fritz Haber Institute, Max Planck Society;

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Jakubith,  S.
Fritz Haber Institute, Max Planck Society;

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Kubala,  Sven
Physical Chemistry, Fritz Haber Institute, Max Planck Society;

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Oertzen,  Alexander von
Physical Chemistry, Fritz Haber Institute, Max Planck Society;

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Ertl,  Gerhard
Physical Chemistry, Fritz Haber Institute, Max Planck Society;

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Citation

Rotermund, H.-H., Jakubith, S., Kubala, S., Oertzen, A. v., & Ertl, G. (1990). Investigation of surfaces by scanning photoemission microscopy. Journal of Electron Spectroscopy and Related Phenomena, 52, 811-819. doi:10.1016/0368-2048(90)85066-I.


Cite as: https://hdl.handle.net/21.11116/0000-0008-7003-6
Abstract
The principle of this novel technique of scanning photoemission microscopy (SPM) consists in recording the total yield of electrons emitted by UV light focussed onto a small spot on the surface through a microscope objective while the x,y-position is continuously varied. A 1 × 1 mm2 image, for example, can be recorded within less than 10 sec with a lateral resolution of about 3 μm. The absolute work functions of selected spots can be determined by recording the electron yield as a function of photon energy. The method is perfectly non-destructive, even with sensitive adsorbed layers. Results are shown for a polycrystalline Pt surface and its interaction with oxygen and carbon monoxide.