Artifacts in multilayer depth profiling: Origin and quantification of a double 
peak layer profile of Ag in ToF-SIMS depth profiles of an Ag/Ni multilayer

Hofmann, S.; Yang, H.; Kovač, J.; Ekard, J.; Song, Y. B.; Wang, J. Y.

doi:10.1016/j.matchar.2020.110774

Item

ITEM ACTIONSEXPORT

Add to Basket

Local TagsRelease HistoryDetailsSummary

Released

Journal Article

Artifacts in multilayer depth profiling: Origin and quantification of a double peak layer profile of Ag in ToF-SIMS depth profiles of an Ag/Ni multilayer

MPS-Authors

/persons/resource/persons75598

Hofmann, S.
Department of Physics, Shantou University, 243 Daxue Road, Shantou, 515063, Guangdong, China;
Emeriti and Others, Max Planck Institute for Intelligent Systems, Max Planck Society;

External Resource

No external resources are shared

Fulltext (restricted access)

There are currently no full texts shared for your IP range.

Fulltext (public)

There are no public fulltexts stored in PuRe

Supplementary Material (public)

There is no public supplementary material available

Citation

Hofmann, S., Yang, H., Kovač, J., Ekard, J., Song, Y. B., & Wang, J. Y. (2021). Artifacts in multilayer depth profiling: Origin and quantification of a double peak layer profile of Ag in ToF-SIMS depth profiles of an Ag/Ni multilayer. Materials Characterization, 171: 110774. doi:10.1016/j.matchar.2020.110774.

Cite as: https://hdl.handle.net/21.11116/0000-0008-7322-0

Abstract

There is no abstract available