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The structure of NO on Ni(111) at low coverage

MPS-Authors
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Lindsay,  Robert
Fritz Haber Institute, Max Planck Society;

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Theobald,  Andreas
Fritz Haber Institute, Max Planck Society;

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Gießel,  Tatjana
Physical Chemistry, Fritz Haber Institute, Max Planck Society;

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Schaff,  Oliver
Fritz Haber Institute, Max Planck Society;

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Bradshaw,  Alexander M.
Fritz Haber Institute, Max Planck Society;

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Citation

Lindsay, R., Theobald, A., Gießel, T., Schaff, O., Bradshaw, A. M., Booth, N. A., et al. (1998). The structure of NO on Ni(111) at low coverage. Surface Science, 405(2-3), L566-L572. doi:10.1016/S0039-6028(98)00172-1.


Cite as: https://hdl.handle.net/21.11116/0000-0008-B473-B
Abstract
Scanned-energy mode photoelectron diffraction from the N 1s and O 1s core levels has been used to determine the local adsorption geometry of NO on Ni(111) at a coverage of 0.25 ML. The optimum surface geometry consists of NO molecules adsorbed in both the fcc and hcp three-fold hollow sites in a ratio of approximately 50/50 (the fcc site occupation is 50(−20/+17)% for the N 1s data, and 47(−30/+25)% for the O 1s data). N–Ni bond lengths are almost identical for the two sites: 1.83±0.07 Å (fcc) and 1.85±0.07 Å (hcp). We conclude that for NO adsorption on Ni(111), the fcc and hcp sites are energetically similar.