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The dimers stay intact: a quantitative photoelectron study of the adsorption system Si{100} (2x1)-C2H4

MPS-Authors
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Baumgärtel,  Peter
Fritz Haber Institute, Max Planck Society;

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Lindsay,  Robert
Fritz Haber Institute, Max Planck Society;

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Schaff,  Oliver
Fritz Haber Institute, Max Planck Society;

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Gießel,  Tatjana
Physical Chemistry, Fritz Haber Institute, Max Planck Society;

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Terborg,  Ralf
Fritz Haber Institute, Max Planck Society;

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Hoeft,  Jon Tobias
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Polcik,  Martin
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Bradshaw,  Alexander M.
Fritz Haber Institute, Max Planck Society;

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P_Baumgärtel_1999_New_J._Phys._1_20.pdf
(Publisher version), 365KB

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Citation

Baumgärtel, P., Lindsay, R., Schaff, O., Gießel, T., Terborg, R., Hoeft, J. T., et al. (1999). The dimers stay intact: a quantitative photoelectron study of the adsorption system Si{100} (2x1)-C2H4. New Journal of Physics, 1, 20.1-20.15. doi:10.1088/1367-2630/1/1/320.


Cite as: https://hdl.handle.net/21.11116/0000-0008-BC01-3
Abstract
Using the technique of photoelectron diffraction in the scanned energy mode we show that the Si dimer separation on the Si{100} surface following the adsorption of ethene (ethylene) is 2.36(±0.21) Å. This value is only very slightly larger than on the clean surface and shows that the dimer remains intact, thus providing a clear quantitative experimental resolution of a long controversy in the literature. The C-C and C-Si separations are 1.62±0.08 Å and 1.90±0.01 Å, respectively, the former indicating a bond order of less than one.