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Interaction of rhodium with hydroxylated alumina model substrates

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Libuda,  Jörg
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Frank,  Martin M.
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Bäumer,  Marcus
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Freund,  Hans-Joachim
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Citation

Libuda, J., Frank, M. M., Sandell, A., Andersson, S., Brühwiller, P. A., Bäumer, M., et al. (1997). Interaction of rhodium with hydroxylated alumina model substrates. Surface Science, 384(1-3), 106-119. doi:10.1016/S0039-6028(97)00170-2.


Cite as: https://hdl.handle.net/21.11116/0000-0008-C77E-B
Abstract
In order to investigate how metal growth and metal-oxide interaction depend on the chemical properties of oxide surfaces, we describe a modification procedure which allows the introduction of surface hydroxyl groups on a well-ordered Al2O3 film on NiAl(110). The modification — based on deposition of metallic Al and subsequent water exposure — is characterized using LEED spot-profile analysis (SPA-LEED) and high-resolution photoelectron spectroscopy (PES). Upon Al deposition, small aggregates are formed, which are oxidized completely in the final preparation step as verified via PES. The presence of OH-groups is supported by the appearance of additional Al 2p and O 1s surface features. The origin of oxide core and valence level binding energy shifts induced by the modification procedure is discussed. Growth and metal-substrate interaction of Rh deposited onto the hydroxylated Al2O3 film is compared to Rh growth on the non-modified oxide surface. It is shown that at 300 K nucleation preferentially occurs on modified oxide areas (SPA-LEED). Photoelectron spectroscopy of both oxide and rhodium core levels points to a direct chemical interaction between the metal and surface hydroxyl groups.