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From epitaxially grown thin films to grain boundary analysis in Cu and Ti

MPS-Authors
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Devulapalli,  Vivek
Advanced Transmission Electron Microscopy, Structure and Nano-/ Micromechanics of Materials, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Frommeyer,  Lena
Advanced Transmission Electron Microscopy, Structure and Nano-/ Micromechanics of Materials, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Ghidelli,  Matteo
Thin Films and Nanostructured Materials, Structure and Nano-/ Micromechanics of Materials, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Liebscher,  Christian
Advanced Transmission Electron Microscopy, Structure and Nano-/ Micromechanics of Materials, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Dehm,  Gerhard
Structure and Nano-/ Micromechanics of Materials, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Citation

Devulapalli, V., Frommeyer, L., Ghidelli, M., Liebscher, C., & Dehm, G. (2019). From epitaxially grown thin films to grain boundary analysis in Cu and Ti. Poster presented at International Workshop on Advanced and In-situ Microscopies of Functional Nanomaterials and Devices, IAMNano, Düsseldorf, Germany.


Cite as: https://hdl.handle.net/21.11116/0000-0008-D5FA-E
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