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Spontaneous fluctuations in a plasma ion assisted deposition – correlation between deposition conditions and vanadium oxide thin film growth

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Frank,  Anna
Nanoanalytics and Interfaces, Independent Max Planck Research Groups, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Hieke,  Stefan Werner
Nanoanalytics and Interfaces, Independent Max Planck Research Groups, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;

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Scheu,  Christina
Nanoanalytics and Interfaces, Independent Max Planck Research Groups, Max-Planck-Institut für Eisenforschung GmbH, Max Planck Society;
Materials Analytics, RWTH Aachen University, Kopernikusstrasse 10, Aachen, Germany;

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Citation

Frank, A., Dias, M., Hieke, S. W., Kruth, A., & Scheu, C. (2021). Spontaneous fluctuations in a plasma ion assisted deposition – correlation between deposition conditions and vanadium oxide thin film growth. Thin Solid Films, 722: 138574. doi:10.1016/j.tsf.2021.138574.


Cite as: http://hdl.handle.net/21.11116/0000-0008-F3CC-0
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