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Structure and electronic properties of ultrathin oxide films on metallic substrates

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Kuhlenbeck,  Helmut
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Freund,  Hans-Joachim
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Citation

Kuhlenbeck, H., & Freund, H.-J. (1997). Structure and electronic properties of ultrathin oxide films on metallic substrates. In D. A. King, & D. P. Woodruff (Eds.), Growth and Properties of Ultrathin Epitaxial Layers (pp. 340-374). Amsterdam: Elsevier.


Cite as: https://hdl.handle.net/21.11116/0000-0009-0549-0
Abstract
This chapter will deal with the properties of ultrathin oxide layers on different substrates. We will discuss different modes of preparation, the surface geometry of the respective oxide films and their electronic properties. The focus will be put onto the systems NiO(100)/Ni(100), NiO(111)/Ni(111), Cr2O3(0001)/Cr(110) and Al2O3(111)/NiAl(110), that are prepared by oxidation of metal or alloy single crystals in an oxygen atmosphere at elevated temperature. We will also discuss systems where the oxide film is prepared by oxidation of a metal which is evaporated onto an inert substrate.