English
 
Help Privacy Policy Disclaimer
  Advanced SearchBrowse

Item

ITEM ACTIONSEXPORT

Released

Journal Article

Micromachining of Al2O3 thin films via laser drilling and plasma etching for interfacing copper

MPS-Authors
/persons/resource/persons225926

Dogan,  G.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;
Robert Bosch GmbH, Automotive Electronics;

/persons/resource/persons76085

Schütz,  G.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;

/persons/resource/persons75670

Keskinbora,  K.
Dept. Modern Magnetic Systems, Max Planck Institute for Intelligent Systems, Max Planck Society;
Massachusetts Institute of Technology;

External Resource
No external resources are shared
Fulltext (public)
There are no public fulltexts stored in PuRe
Supplementary Material (public)
There is no public supplementary material available
Citation

Dogan, G., Chiu, F., Chen, S. U. H., David, M. R. T., Michalowski, A., Schänzel, M., et al. (2021). Micromachining of Al2O3 thin films via laser drilling and plasma etching for interfacing copper. Materials & Design, 210: 110114. doi:10.1016/j.matdes.2021.110114.


Cite as: http://hdl.handle.net/21.11116/0000-0009-2E5D-D
Abstract
There is no abstract available