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Abstract

We have developed an instrument that uses photolysis of hydrogen halides to produce nearly monoenergetic hydrogen atom beams and Rydberg atom tagging to obtain accurate angle-resolved time-of-flight distributions of atoms scattered from surfaces. The surfaces are prepared under strict ultrahigh vacuum conditions. Data from these experiments can provide excellent benchmarks for theory, from which it is possible to obtain an atomic scale understanding of the underlying dynamical processes governing H atom adsorption. In this way, the mechanism of adsorption on metals is revealed, showing a penetration–resurfacing mechanism that relies on electronic excitation of the metal by the H atom to succeed. Contrasting this, when H atoms collide at graphene surfaces, the dynamics of bond formation involving at least four carbon atoms govern adsorption. Future perspectives of H atom scattering from surfaces are also outlined.