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Analysis and Interpretation of Scanning Tunneling Microscopy Images in an Electrochemical Environment: Copper on AU(111)

MPS-Authors
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Haiss,  Wolfgang
Fritz Haber Institute, Max Planck Society;

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Sass,  Jürgen-Kurt
Fritz Haber Institute, Max Planck Society;

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Lackey,  Damian
Fritz Haber Institute, Max Planck Society;

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Heel,  Marin van
Fritz Haber Institute, Max Planck Society;

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Citation

Haiss, W., Sass, J.-K., Lackey, D., & Heel, M. v. (1994). Analysis and Interpretation of Scanning Tunneling Microscopy Images in an Electrochemical Environment: Copper on AU(111). In S. H. Cohen (Ed.), Atomic Force Microscopy/Scanning Tunneling Microscopy (pp. 423-435). Boston: Springer.


Cite as: http://hdl.handle.net/21.11116/0000-0009-8638-1
Abstract
The electrochemical deposition of a copper monolayer on Au(111) has been studied by STM in H2SO and Na2SO4 solutions. Three different superstructures, which are attributed to the adsorption of either HSO , SO 4 2− or both anions, have been observed for the full monolayer. Evidence for the expected epitaxial (1 × 1) overlayer was also obtained at very negative potentials, by avoiding bulk copper growth. A novel STM data analysis by multivariate statistical procedures is shown to provide detailed information, which is not evident in the raw data. The need for a better understanding of the tunneling and imaging mechanisms in an electrochemical environment is emphasized.