CHF3 adsorption and decomposition on clean and oxygen covered Al(111)

Kawada, Hiroki; Reiff, Stefan; Block, Jochen H.

doi:10.1016/0169-4332(96)00344-3

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CHF₃ adsorption and decomposition on clean and oxygen covered Al(111)

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Kawada, Hiroki
Fritz Haber Institute, Max Planck Society;

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Reiff, Stefan
Fritz Haber Institute, Max Planck Society;

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Block, Jochen H.
Fritz Haber Institute, Max Planck Society;

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Kawada, H., Reiff, S., & Block, J. H. (1996). CHF₃ adsorption and decomposition on clean and oxygen covered Al(111). Applied Surface Science, 100-101, 587-591. doi:10.1016/0169-4332(96)00344-3.

Cite as: https://hdl.handle.net/21.11116/0000-0009-BCB7-5

Abstract

The adsorption and decomposition of trifluoromethane (CHF₃) on clean and oxygen dosed Al(111) were examined by means of electron energy loss spectroscopy (EELS), Auger electron spectroscopy (AES) and low energy electron diffraction (LEED). CHF₃ adsorbs on the clean surface at 120 K. The coadsorption of CHF₃ and chemisorbed oxygen leads to a change in the adsorption state of CHF₃ indicated by the appearance of new vibrational modes in the EELS spectrum. The presence of minute amounts of oxidic oxygen that can be distinguished from the chemisorbed species has no detectable effect on the reaction behavior of CHF₃. Annealing of the CHF₃/oxygen adlayer to temperatures in excess of 150 K gives rise to altered EELS features that can be attributed to a decomposition of CHF₃.