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Exoelectron emission during oxidation of Cs films

MPS-Authors
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Böttcher,  Artur
Physical Chemistry, Fritz Haber Institute, Max Planck Society;

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Grobecker,  Ralph
Fritz Haber Institute, Max Planck Society;

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Imbeck,  R.
Fritz Haber Institute, Max Planck Society;

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Morgante,  A.
Fritz Haber Institute, Max Planck Society;

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Ertl,  Gerhard
Physical Chemistry, Fritz Haber Institute, Max Planck Society;

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Citation

Böttcher, A., Grobecker, R., Imbeck, R., Morgante, A., & Ertl, G. (1991). Exoelectron emission during oxidation of Cs films. The Journal of Chemical Physics, 95(5), 3756-3766. doi:/10.1063/1.460826.


Cite as: https://hdl.handle.net/21.11116/0000-000A-2903-5
Abstract
During oxidation of thin Cs films, a nonadiabatic surface reaction manifests itself in the emission of electrons. This effect was investigated in detail by combining measurements of the current and of energy distributions of these exoelectrons with studies on the electronic properties of the surface by means of ultraviolet photoelectron spectroscopy and metastable deexcitation spectroscopy. Exoelectron emission occurs via Auger deexcitation of the empty state derived from the O2 affinity level. This process is confined to the stage Cs2O2→CsO2 in which resonance ionization of the affinity level of the impinging O2 molecule upon crossing the Fermi level EF is efficiently suppressed due to the absence of metallic states near EF. A kinetic model based on the successive steps involved in the oxidation of Cs is developed which describes qualitatively well all the experimental findings.