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Ambient pressure X-ray photoelectron spectroscopy study of room-temperature oxygen adsorption on Cu(1 0 0) and Cu(1 1 1)

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Bluhm,  Hendrik
Chemical Sciences Division, Lawrence Berkeley National Laboratory;
Advanced Light Source, Lawrence Berkeley National Laboratory;
Inorganic Chemistry, Fritz Haber Institute, Max Planck Society;

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Citation

Liu, B.-H., Huber, M., van Spronsen, M. A., Salmeron, M., & Bluhm, H. (2022). Ambient pressure X-ray photoelectron spectroscopy study of room-temperature oxygen adsorption on Cu(1 0 0) and Cu(1 1 1). Applied Surface Science, 583: 152438. doi:10.1016/j.apsusc.2022.152438.


Cite as: https://hdl.handle.net/21.11116/0000-000A-52DD-1
Abstract
We investigated the room-temperature chemisorption of oxygen on Cu(1 0 0) and Cu(1 1 1) using ambient-pressure X-ray photoelectron spectroscopy (APXPS). A shoulder-to-shoulder comparison between the oxygen-gas titration on the two surfaces reveals that Cu(1 0 0) is the more active for oxygen dissociative chemisorption when the surfaces are clean. The (2 √ 2 × √ 2 )R45o missing-row reconstruction appears in Cu(1 0 0)’s LEED image after about 104 Langmuir of oxygen exposure, whereas on Cu(1 1 1), no long-range ordering was observed throughout the whole experiment. An oxide layer consisting of cuprous and cupric oxide shows up on Cu(1 1 1) at an oxygen exposure that is significantly lower than for Cu(1 0 0). This observation suggests that the presence of (2 √ 2 × √ 2 )R45o missing-row reconstruction layer slows down Cu(1 0 0) oxidation. Literature has widely reported that surface morphology influences the copper oxidation process. This study provides an XPS demonstration that copper surface oxide formation in O2 at room temperature depends on the surface crystallographic orientation.