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Atomic layer deposition of the conductive delafossite PtCoO2

MPS-Authors
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Hagen,  Dirk J.
Nano-Systems from Ions, Spins and Electrons, Max Planck Institute of Microstructure Physics, Max Planck Society;

/persons/resource/persons260487

Yoon,  Jiho
Nano-Systems from Ions, Spins and Electrons, Max Planck Institute of Microstructure Physics, Max Planck Society;

/persons/resource/persons272846

Zhang,  Haojie
Nano-Systems from Ions, Spins and Electrons, Max Planck Institute of Microstructure Physics, Max Planck Society;

/persons/resource/persons263349

Kalkofen,  Bodo
Nano-Systems from Ions, Spins and Electrons, Max Planck Institute of Microstructure Physics, Max Planck Society;

/persons/resource/persons272848

Silinskas,  Mindaugas
Nano-Systems from Ions, Spins and Electrons, Max Planck Institute of Microstructure Physics, Max Planck Society;

Börrnert,  Felix
Nano-Systems from Ions, Spins and Electrons, Max Planck Institute of Microstructure Physics, Max Planck Society;

/persons/resource/persons260920

Han,  Hyeon
Nano-Systems from Ions, Spins and Electrons, Max Planck Institute of Microstructure Physics, Max Planck Society;

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Parkin,  Stuart S. P.       
Nano-Systems from Ions, Spins and Electrons, Max Planck Institute of Microstructure Physics, Max Planck Society;

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AdvMaterialsInter-2022-Hagen.pdf
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Citation

Hagen, D. J., Yoon, J., Zhang, H., Kalkofen, B., Silinskas, M., Börrnert, F., et al. (2022). Atomic layer deposition of the conductive delafossite PtCoO2. Advanced Materials Interfaces, 9(12): 2200013. doi:10.1002/admi.202200013.


Cite as: https://hdl.handle.net/21.11116/0000-000A-5B7C-6
Abstract
The first atomic layer deposition process for a ternary oxide is reported, which contains a metal of the platinum group, the delafossite PtCoO2. The deposition with the precursors trimethyl-Pt-methylcyclopentadienyl, Co-bis(N-t-butyl-N′-ethylpropanimidamidate), and oxygen plasma results in a process with a nearly constant growth rate and stoichiometric composition over a wide temperature window from 100 to 320 °C. Annealing of the as-deposited amorphous films in an oxygen atmosphere in a temperature window from 700 to 800 °C leads to the formation of the delafossite phase. Very thin films show a pronounced preferred orientation with the Pt sheets being almost parallel to the substrate surface while arbitrary orientation is observed for thicker films. The conformal coating of narrow trenches highlights the potential of this atomic-layer-deposition process. Moreover, heterostructures with magnetic films are fabricated to demonstrate the potential of PtCoO2 for spintronic applications.