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Variation of bending rigidity with material density: bilayer silica with nanoscale holes

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Büchner,  Christin
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Heyde,  Markus
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Freund,  Hans-Joachim
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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Citation

Tømterud, M., Eder, S. D., Büchner, C., Heyde, M., Freund, H.-J., Manson, J. R., et al. (2022). Variation of bending rigidity with material density: bilayer silica with nanoscale holes. Physical Chemistry Chemical Physics, 24(30), 17941-17945. doi:10.1039/d2cp01960d.


Cite as: https://hdl.handle.net/21.11116/0000-000A-A6D4-B
Abstract
Two dimensional (2D) materials are a young class of materials that is foreseen to play an important role as building blocks in a range of applications, e.g. flexible electronics. For such applications, mechanical properties such as the bending rigidity κ are important. Only a few published measurements of the bending rigidity are available for 2D materials. Nearly unexplored is the question of how the 2D material density influences the bending rigidity. Here, we present helium atom scattering measurements on a “holey” bilayer silica with a density of 1.4 mg m−2, corresponding to 1.7 monolayers coverage. We find a bending rigidity of 6.6 ± 0.3 meV, which is lower than previously published measurements for a complete 2D film, where a value of 8.8 ± 0.5 meV was obtained. The decrease of bending rigidity with lower density is in agreement with theoretical predictions.