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Two-Dimensional Ultrathin Silica Films

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Freund,  Hans-Joachim
Chemical Physics, Fritz Haber Institute, Max Planck Society;

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acs.chemrev.1c00995.pdf
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Citation

Zhong, J.-Q., & Freund, H.-J. (2022). Two-Dimensional Ultrathin Silica Films. Chemical Reviews, 122(13), 11172-11246. doi:10.1021/acs.chemrev.1c00995.


Cite as: https://hdl.handle.net/21.11116/0000-000A-BE22-A
Abstract
Two-dimensional (2D) ultrathin silica films have the potential to reach technological importance in electronics and catalysis. Several well-defined 2D-silica structures have been synthesized so far. The silica bilayer represents a 2D material with SiO2 stoichiometry. It consists of precisely two layers of tetrahedral [SiO4] building blocks, corner connected via oxygen bridges, thus forming a self-saturated silicon dioxide sheet with a thickness of ∼0.5 nm. Inspired by recent successful preparations and characterizations of these 2D-silica model systems, scientists now can forge novel concepts for realistic systems, particularly by atomic-scale studies with the most powerful and advanced surface science techniques and density functional theory calculations. This Review provides a solid introduction to these recent developments, breakthroughs, and implications on ultrathin 2D-silica films, including their atomic/electronic structures, chemical modifications, atom/molecule adsorptions, and catalytic reactivity properties, which can help to stimulate further investigations and understandings of these fundamentally important 2D materials.